ASML Secures €4.2 B Orders for 14 Low-NA EUV Machines
ASML’s backlog of low-NA EUV scanners has reached 14 units, representing approximately €4.2 billion in potential revenue, with first systems due to ship in Q4 2026. TSMC and Samsung have each placed initial orders, underpinning an expected 10% lift in ASML’s EUV-related revenue in fiscal 2027.
1. Order Backlog and Revenue Implications
ASML’s backlog of 14 low-NA EUV scanners equates to roughly €4.2 billion in potential sales, bolstering the company’s multi-year order book. With first deliveries slated for Q4 2026, these high-value systems are forecast to drive a 10% increase in EUV segment revenue in fiscal 2027.
2. Customer Commitments and Market Adoption
Leading foundries TSMC and Samsung have each committed to initial low-NA EUV orders, signalling broad interest in next-generation lithography. These commitments pave the way for further orders from Intel and other advanced-node manufacturers seeking sub-2nm process capabilities.
3. Technical Advantages and Competitive Positioning
Low-NA EUV offers a significant throughput boost over high-NA predecessors, enabling chipmakers to increase wafer output while advancing to more complex nodes. ASML’s early lead in volume production tooling cements its position at the forefront of high-end photolithography technology.