ASML Unveils 1,000W EUV Breakthrough to Boost Chip Output 50% by 2030
ASML’s researchers have developed an EUV light source capable of sustained 1,000 watts, enabling wafer throughput to rise from about 220 to 330 per hour and potentially boosting chip output by 50% by 2030. It generated $39.16 billion in 2025 sales and ended the year with a $46.5 billion backlog.
1. EUV Power Breakthrough
ASML’s R&D team has developed an EUV light source capable of sustaining 1,000 watts under customer conditions, up from current levels. This advancement is projected to increase wafer throughput from about 220 to 330 per hour and boost chip output by up to 50% by the end of the decade.
2. Market Position and Competition
ASML remains the sole manufacturer of commercial EUV lithography systems, reinforcing its technological lead. Export restrictions limit system sales to China and U.S. startups like Substrate and xLight face significant technological hurdles, sustaining ASML’s dominant market share.
3. Financial Results and Outlook
ASML reported full-year 2025 net sales of $39.16 billion and ended the year with a $46.5 billion order backlog. The company projects 2026 net sales between $40.72 billion and $46.7 billion and has authorized a $14.37 billion share repurchase program.