imec Acquires $400M ASML High NA EUV Tool to Aid Intel Chip Development
imec has secured a $400 million ASML High NA EUV lithography machine—one of fewer than a dozen—positioning Intel and other customers to develop smaller AI logic and high-bandwidth memory chips by 2027. High NA tools enable chip features up to 66% smaller, boosting performance and energy efficiency.
1. imec Acquires ASML High NA EUV Tool
imec has purchased a $400 million High NA EUV lithography machine—one of fewer than twelve globally—to serve as the centerpiece of its 2.5 billion-euro NanoIC pilot line.
2. Intel's Next-Gen Chip Strategy
Intel is among the customers preparing to deploy High NA tools in commercial production by 2027, targeting new AI logic and high-bandwidth memory chip designs.
3. Technical Advantages of High NA
The enhanced numerical aperture enables circuit features up to 66% smaller than current EUV systems, translating into faster processing speeds and improved energy efficiency.
4. Collaborative and Strategic Impact
Through shared access in a factory-like setting, imec reinforces Europe's semiconductor sovereignty while providing Intel and partners a platform for advanced lithography validation.