imec Secures $400 Million ASML High NA EUV Tool for €2.5 Billion NanoIC Line
Belgian chip lab imec secured a $400 million ASML High NA EUV lithography machine—one of fewer than a dozen—for its 2.5 billion-euro NanoIC line backed by €1.4 billion EU funds. imec will share this tool with partners like Applied Materials to develop sub-10 nm AI logic and high-bandwidth memory chips by 2027.
1. imec’s High NA EUV Acquisition
imec has purchased a $400 million ASML High NA EUV lithography machine—one of fewer than a dozen globally—as the central asset for its 2.5 billion-euro NanoIC pilot line, supported by €1.4 billion from EU funding.
2. Collaboration with Applied Materials
Under its shared-access model, imec will provide the High NA tool to equipment partners including Applied Materials, enabling them to test and refine next-generation chipmaking processes in a factory-style environment.
3. Implications for Chip Production
The High NA EUV system’s larger numerical aperture enables chip features up to 66% smaller, facilitating development of faster sub-10 nm AI logic and high-bandwidth memory chips slated for commercial production by 2027.