imec Secures $400M ASML High NA EUV Tool to Enable 66% Smaller Chips
imec has secured a $400 million ASML High NA EUV lithography tool—one of fewer than a dozen worldwide—for its 2.5 billion-euro NanoIC line backed by 1.4 billion euros public funding. The system enables circuit features up to 66% smaller, supporting AI logic and high-bandwidth memory chip production by 2027.
1. imec Purchase Details
imec has finalized acquisition of a $400 million ASML High NA EUV lithography system, marking one of fewer than a dozen installations globally. The purchase secures access to leading-edge chipmaking capabilities and builds on imec’s history of collaborating with equipment manufacturers.
2. NanoIC Pilot Line Funding
The High NA tool will anchor imec’s 2.5 billion-euro NanoIC pilot line, of which 1.4 billion euros are financed through public grants under the EU Chips Act. Shared access to the line allows multiple firms and researchers to test next-generation tools in a factory-like environment.
3. High NA Tool Capabilities
With its larger numerical aperture, the High NA system can produce chip circuit features up to 66% smaller, translating into faster performance and improved energy efficiency. ASML confirms the technology is ready for commercial deployment, targeting AI logic and high-bandwidth memory chips.
4. Industry Implications
Intel, SK Hynix and other customers are gearing up to leverage High NA tools for mass production as early as 2027, underscoring Europe’s role in the global semiconductor supply chain. The deal reinforces strategic autonomy by localizing access to cutting-edge lithography.