MATCH Act Threatens 19% of ASML’s Sales With DUV and EUV Ban
ASML•Dutch Trade Minister Sjoerd Sjoerdsma visited Washington to oppose the MATCH Act’s ban on Chinese use of ASML’s DUV immersion and EUV lithography systems. China makes up 19% of ASML’s net system sales, and export controls could cut off decade-old DUV shipments and tighten EUV restrictions, risking one-fifth of revenue.
1. MATCH Act Provisions
In April, US lawmakers introduced the MATCH Act to extend export controls and bar Chinese chipmakers from acquiring ASML’s immersed deep ultraviolet (DUV) systems in addition to the existing ban on its extreme ultraviolet (EUV) machines.
2. China Sales Exposure
ASML derives 19% of its net system sales from China, primarily through older-generation DUV lithography tools shipped over the past decade. A full ban on those machines could eliminate revenue streams worth roughly one-fifth of total system sales.
3. Government Intervention
Dutch Trade Minister Sjoerd Sjoerdsma travelled to Washington for direct talks with US officials and lawmakers, urging allied countries to opt for voluntary technology controls rather than extraterritorial mandates. The Netherlands plans further meetings to influence legislative outcomes and protect ASML’s market access.
