Samsung Electronics, ASML expand High NA EUV lithography collaboration
SMH•Samsung expands partnership with ASML on High NA EUV
Samsung Electronics expanded its strategic partnership with ASML to deepen collaboration on High NA EUV lithography for next-generation chip manufacturing.
Samsung will join an industry initiative to develop a 12-inch photomask platform for High NA EUV, targeting higher productivity and lower costs.
Plans call for introducing ASML’s High NA EUV into future DRAM high-volume manufacturing by 2028, a first for the industry.
