In early 2025, ASML commenced deliveries of its EXE:5200 high-numerical-aperture (HNA) EUV lithography system, following successful factory acceptance testing of the EXE:5000 prototype in late 2024. The EXE:5200 offers a throughput improvement of nearly 20% over its predecessor and supports single-patterning at sub-8nm pitches. ASML reported that the first two machines were installed at its customer’s U.S. R&D facility by February, marking the earliest commercial deployment of HNA EUV tooling. The company expects to ship a total of five units of the EXE:5200 during the first half of 2025, up from three units of the EXE:5000 in 2024. During ASML’s February capital markets day, CEO Peter Wennink emphasized that high-NA EUV will drive a significant portion of the group’s revenue growth in 2025 and beyond. He reiterated ASML’s target of increasing EUV revenue by 35% year-over-year and projecting HNA shipments to contribute up to €3 billion in incremental sales for the full year. Wennink also noted ongoing investments in capacity expansion at ASML’s Veldhoven headquarters, including the addition of 1,200 clean-room staff and the commissioning of two new sub-assembly lines dedicated to HNA optics and ultra-precision stages. ASML’s order intake for HNA EUV systems remains robust, with industry insiders estimating that one major customer has reserved all available HNA capacity for 2024 and 2025. ASML’s backlog as of December stood at €31 billion, including €2.4 billion attributable to EXE:5200 orders. Management confirmed that at least six HNA machines are earmarked for delivery to a single chipmaker over the next 18 months, reflecting accelerated adoption of the technology. This customer has already taken delivery of three HNA systems—two EXE:5000 units in Q1 and Q3 2024 and one EXE:5200 in Q1 2025—and is on track to receive the remainder in its upcoming 18A production ramp.