Intel Foundry, ASML expand collaboration to speed High-NA EUV production readiness
ASML•Collaboration to speed High-NA EUV readiness
ASML entered a collaboration with Intel Foundry to speed industry readiness for High-NA EUV lithography production.
Progress update was presented at the SPIE Photomask Technology + Extreme Ultraviolet Lithography conference.
The partnership targets production deployment of High-NA EUV tools, shaping future adoption across advanced chip manufacturing.
