Intel Foundry, ASML present High NA EUV production progress at SPIE Photomask conference
INTC•Intel 18A layers meeting performance targets
Intel 18A layers patterned with High NA are meeting or exceeding performance versus comparable layers patterned on ASML’s 0.33 NA NXE EUV platform.
The companies emphasized near-term High NA use with standard 6-inch masks, supported by reticle stitching and PDK solutions.
Intel continues to push an industry shift toward 6x12-inch masks, aiming to align standards and infrastructure for future High NA scaling.
High NA EUV readiness highlighted at SPIE conference
Intel Foundry attended the SPIE Photomask Technology + Extreme Ultraviolet Lithography conference to highlight progress on High NA EUV readiness.
High NA EUV is in high-volume manufacturing at Intel, with more than 1,000,000 wafers processed across certification, R&D, and select production layers.
