Imec Unveils €2.5B Pilot Fab with ASML EUV for Sub-5 nm AI Chips
Imec has launched a €2.5 billion pilot line in Leuven equipped with ASML’s state-of-the-art EUV lithography systems to prototype sub-5 nm logic chips for AI applications. The facility aims to begin device prototyping in mid-2026, bolstering Europe’s semiconductor autonomy and likely driving incremental ASML equipment orders.
1. Facility Launch
Imec formally inaugurated its €2.5 billion chip pilot line in Leuven in February 2026, marking the first dedicated facility in Europe for advanced logic prototyping. The new fab is designed to accelerate early-stage development of AI accelerators and custom semiconductor designs under one roof.
2. Technical Setup
The pilot line is equipped with multiple ASML Twinscan NXE extreme ultraviolet lithography scanners, enabling patterning of features below 5 nm. Additional cluster tools for etch, deposition and metrology allow the facility to process research-scale wafers at throughputs suitable for design iterations.
3. Strategic Impact
By hosting Europe’s most advanced prototyping line, Imec aims to reduce development lead times and lessen dependence on overseas foundries. The project underscores strong regional demand for ASML’s latest EUV systems and is expected to contribute meaningful equipment orders to ASML’s 2026 bookings.